CVD Equipment Corporation a leading provider of chemical vapor deposition systems, announced that it has received an order for a production Plasma Enhanced Chemical Vapor Deposition (PECVD) system valued at approximately $1M. This system PECVD200 will be used for the production of discrete semiconductor devices on 200 mm wafers to support 5G Wireless technology. CVD plans to deliver this system before the end of this calendar year.
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The configurable cluster tool platform can accommodate up to three (3) PECVD process modules for increased production throughout, depositing carbon-based materials onto 200mm wafers. The process module features advances in multi-zone heating and temperature stabilization for optimal deposition uniformity. Additionally, the PECVD200 system will be SECS/GEM industry compliant (Semiconductor Equipment Communications Standard/Generic Equipment Model) to enable defined communication capabilities for monitoring and controlling the equipment in a Foundry. This advanced PECVD200 system launches a new cluster tool product platform for the Company, conforming to international communication standards enabling high volume manufacturing of discrete electronic components.
“CVD continues to solidify its position in the growth and deposition of carbon materials and we are proud to have been selected to provide this system and technology as it is aligned with our strategic growth objectives of serving production application products,” said Emmanuel Lakios, President and CEO of CVD Equipment Corporation.
About CVD Equipment Corporation
CVD Equipment Corporation designs, develops, and manufactures a broad range of chemical vapor deposition, gas control, and other state-of-the-art equipment and process solutions used to develop and manufacture materials and coatings for research and industrial applications. This equipment is used by its customers to research, design, and manufacture these materials or coatings for aerospace engine components, medical implants, semiconductors, battery nanomaterial, solar cells, smart glass, carbon nanotubes, nanowires, LEDs, MEMS, and other applications. Through its application laboratory, the Company provides process development support and process startup assistance with the focus on enabling tomorrow’s technologies™. It’s wholly owned subsidiary CVD Materials Corporation provides advanced materials and metal surface treatments and coatings to serve demanding applications in the electronic, biomedical, petroleum, pharmaceutical, and many other industrial markets.
The Private Securities Litigation Reform Act of 1995 provides a “safe harbor” for forward-looking statements. Certain information included in this press release (as well as information included in oral statements or other written statements made or to be made by CVD Equipment Corporation) contains statements that are forward-looking. All statements other than statements of historical fact are hereby identified as “forward-looking statements,” as such term is defined in Section 27A of the Securities Exchange Act of 1933, as amended, and Section 21E of the Securities Exchange Act of 1934, as amended. Such forward looking information involves a number of known and unknown risks and uncertainties that could cause actual results to differ materially from those discussed or anticipated by management. Potential risks and uncertainties include, among other factors, market and business conditions, the COVID-19 pandemic, the success of CVD Equipment Corporation’s growth and sales strategies, the possibility of customer changes in delivery schedules, cancellation of, or failure to receive orders, potential delays in product shipments, delays in obtaining inventory parts from suppliers and failure to satisfy customer acceptance requirements. Past performance in not a guaranty of future results.